LED用蓝宝石晶片湿法腐蚀清洗技术的研究  

Study on Wet Etching Cleaning Technology of Sapphire Wafer for LED

作　　者：郑佳晶[1] 孙敏[1] 张金凤[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2013年第9期8-10,58,共4页Equipment for Electronic Products Manufacturing

摘　　要：介绍了蓝宝石晶片的清洗原理;通过分析蓝宝石的表面净化原理和对湿法腐蚀清洗工艺试验的研究,提出了一种适用于工业化生产蓝宝石晶片的清洗剂和净化工艺,满足了LED领域的蓝宝石晶片表面洁净度要求。The cleanliness principle of sapphire wafer is expounded in detail. By analyzing the sapphire surface purification principles and researching wet etching cleaning process. A suitable for industrial production of sapphire wafer cleaning agents and purification process are proposed. It meets the field of LED sapphire wafer surface cleanliness requirements.

关 键 词：蓝宝石晶片 净化工艺 清洗剂 湿法腐蚀 

分 类 号：TN305.97[电子电信—物理电子学]