双层Mo薄膜的制备工艺与性能  

Sputtering Parameters and Properties of Mo Bilayer Thin Films

作　　者：张艳霞[1] 闫勇[1] 李莎莎[1] 黄涛[1] 刘连[1] 张勇[1] 赵勇[1,2] 余洲[1] 

机构地区：[1]西南交通大学磁浮技术与磁浮列车教育部重点实验室,四川成都610031 [2]新南威尔士大学

出　　处：《稀有金属材料与工程》2013年第10期2107-2111,共5页Rare Metal Materials and Engineering

基　　金：国家自然科学基金(50588201;50872116;51271155);国际热核聚变实验堆(ITER)计划专项(2011GB112001);四川省科技计划项目(2011JY0031;2011JY0130);中央高校基本科研业务费专项资金(SWJTU12CX016;SWJTU11ZT16;SWJTU11ZT31;SWJTU11BR185)

摘　　要：利用直流磁控溅射法在普通钠钙玻璃(SLG)衬底上沉积双层Mo薄膜,对不同条件下沉积的薄膜通过X射线衍射(XRD)仪、扫描电子显微镜(SEM)、四探针电阻仪等对其相结构、表面形貌以及电性能进行测试。结果表明:双层Mo薄膜呈体心立方结构;由于非晶玻璃基底的影响以及沉积时间较短,缓冲层结晶质量差,薄膜表面粗糙,有空洞、裂纹,电阻率大,随温度的升高电阻率减小,薄膜表现出半导体的特性。随着顶层薄膜(溅射工作气压0.1 Pa)沉积时间的增加,薄膜厚度增加,结晶性能变好,表面更加平整、致密,总体电阻率变小,导电性能提高,随温度的升高电阻率增大,薄膜表现出金属特性。与单层膜相比,双层膜具有更低的电阻率,且溅射时间短,厚度薄,能够降低成本,节省源材料,更符合CIGS电池背电极的需求。Molybdenum （Mo） bilayer thin films were deposited on soda-lime glass using DC magnetron sputtering process.The structure,morphology,and electrical properties of Mo films have been studied by XRD,SEM,four-probe tester,etc.The results show that all bilayer films exhibit a body-centered cubic structure.The buffer layer with rough surface and many defects is initially made on the substrate,whose R-T relationship reflects the characteristics of the semiconductor.The resistivity of the thin film decreases with the top layer＇s deposition time increasing.In addition,the R-T relationship of these films shows a metal feature.Compared with the monolayer film,bilayer films have lower resistivity and shorter sputtering time,so it greatly satisfies the requirement of CIGS solar cell back electrode.

关 键 词：MO薄膜 磁控溅射 双层膜 导电机制 电阻率-温度曲线 

分 类 号：TB43[一般工业技术]