铝合金表面磁控溅射TiN薄膜的性能  

Properties of TiN films on aluminium alloy surface prepared by magnetron sputtering process

作　　者：王会强[1,2] 邢艳秋[1] 孙铂[1] 孙维连[1,2] 董婷婷[1] 蒋辉[1] 

机构地区：[1]河北农业大学机电工程学院,河北保定071001 [2]河北省轻金属合金材料工程技术研究中心,河北保定071001

出　　处：《材料热处理学报》2013年第10期176-180,共5页Transactions of Materials and Heat Treatment

基　　金：河北省自然科学基金(E2009000646);河北省科技计划项目(12227209)

摘　　要：利用中频反应磁控溅射技术在铝合金表面成功制备TiN薄膜,通过改变氮气流量、溅射时间、靶功率可以在铝合金表面沉积不同颜色、不同附着力、不同硬度的TiN薄膜,显著改善铝合金表面的性能。采用国际照明委员会CIE1976(L*、a*、b*)来标定薄膜颜色,利用CM-2600d分光测色计研究TiN薄膜的反射率曲线、色差及色彩仿真;采用划格法测量附着力大小并评级;采用MH-6显微硬度计测量TiN薄膜硬度。结果表明,当氮气流量为18 mL/min溅射时间为10 min,靶功率为5 kW时,TiN薄膜呈仿金色,薄膜附着力评为0级,薄膜硬度为427.8 HV,TiN薄膜具有优良的性能。TiN films were deposited on aluminium alloy by mid-frequency reactive magnetron sputtering process. The TiN films with different properties in color, thickness, adhesion and hardness were prepared by changing the processing parameters of nitrogen flow rate, sputtering time and target power. The film color was calibrated based on CIE. The reflectance curve, color shading and color simulation of the films were studied by a photoelectric speetrocolorimeter CM-2600d. The adhesion of TiN films was examined by the scratching grid method, the hardness of TiN films was measured by MH-6 microscopic hardness tester. The results show that the optimum processing parameters as follows：nitrogen flow rate of 18 mL/min, sputtering time of 10 min and target power of 5 kW, by which the TiN thin films with golden yellow color, adhesion of 0 grade and hardness of 427.8 HV. can be obtained and the films have excellent mechanical properties.

关 键 词：中频磁控溅射 铝合金 TIN薄膜 附着力 硬度 

分 类 号：TG174.44[金属学及工艺—金属表面处理]