硅基平面波导材料的制作  

Fabrication of planar waveguide material on silicon

作　　者：吴远大[1] 张乐天[1] 邢华[1] 韦占雄[1] 郑伟[1] 刘国范[1] 张玉书[1] 

机构地区：[1]吉林大学电子工程系光电子国家重点实验室,长春130023

出　　处：《功能材料与器件学报》2000年第4期432-435,共4页Journal of Functional Materials and Devices

摘　　要：采用火焰水解法 (FHD)在Si基上淀积SiO2 预制材料 ,然后在真空中 空气气氛中高温处理 (1 380℃ ) ,制得玻璃化的SiO2 膜材料 ;该材料膜厚适中 (1 0 30 μm)、平整度好、光滑透明 ,适合制作单模、多模列阵平面波导光栅。并利用XRD、SEM、台阶仪等仪器对SiO2 膜进行了测试分析。The SiO 2 films were deposited on silicon substrate by Flame Hydrolysis Deposition (FHD). Then ,the films were consolidated in electric furnaces at 1380℃ to make silica glass. The glass films(10 ~ 30μm thick) were uniform, glassy and transparent, which could be used to fabricate both single-mode and multi-mode arrayed waveguide grating. Finally, the silica films were analyzed by SEM, XRD, etc.

关 键 词：火焰水解法 硅基平面波导材料 波分复用技术 

分 类 号：TN304.12[电子电信—物理电子学] TN252