CVD金刚石大单晶外延生长及高技术应用前景  

Epitaxial Growth of Large Size Single Crystal Diamonds Prepared by CVD Technique and the Prospect in High Technology Applications

作　　者：吕反修[1,2] 黑立富[1,2] 刘杰[1] 宋建华[1,2] 李成明[1] 唐伟忠[1] 陈广超[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083 [2]北京普莱斯曼金刚石科技开发有限公司,北京100083

出　　处：《热处理》2013年第5期1-12,共12页Heat Treatment

基　　金：自然科学基金项目资助;项目编号:51102013

摘　　要：CVD(化学气相沉积)金刚石大单晶生长是CVD金刚石膜研究领域在过去十余年中所取得的重大技术进展之一,在一系列高新技术领域有极其重要的应用前景。针对CVD金刚石大单晶的制备和应用进行了综述。首先对CVD金刚石大单晶生长技术进行了概括性的描述,然后对CVD金刚石单晶制备方法进行详细介绍和评述。并对CVD大单晶在高性能辐射(粒子)探测器、金刚石高温半导体器件、高压物理试验、超精密加工以及在首饰钻戒等方面的应用现状与前景进行了介绍与评述。最后针对CVD高仿钻戒与天然钻戒的鉴别进行了评述,并提出了新的建议。Abstract： Growth of large size single crystal diamonds prepared by chemical vapor deposition （ CVD） is one of the most important technological achievements in the research field of CVD diamond films over the past ten years , which is of extremely importance in a series of high technology application fields .The purpose of the present paper is to give a general review to the preparation and application of large size CVD single crystal diamonds .Firstly, the growth technologies are generally explained .Then a detailed introduction to the deposition method is presented , with a particular emphasis on the microwave plasma CVD and the high power DC Arc Plasma Jet .The present status and future trends in the application fields in the high performance radiation （ particle ） detectors, high temperature semiconductor device , high pressure experimental physics , ultra-precision cutting tools , as well as CVD single crystal jewelries are reviewed .Particularly , the existing methods for identification between the high imitation CVD diamonds and the natural diamonds are discussed and commented .New suggestions are made which may help to increase the identification confidence limit .

关 键 词：金刚石大单晶 化学气相沉积(CVD) 外延生长 高技术应用 

分 类 号：O635.1[理学—高分子化学] O484.1[理学—化学]