紫外纳米压印OLED衬底微结构的模板制备  

Fabrication of the Template for OLED Substrate Microstructures with UV Nanoimprinting Lithography

作　　者：李阳[1] 徐维[1,2] 王忆[1] 陈奎[1] 朱铭佳[1] 潘雅雯 梁景生[1] 

机构地区：[1]五邑大学应用物理与材料学院,广东江门529020 [2]西安交通大学先进制造技术研究所,西安710049

出　　处：《微纳电子技术》2013年第11期721-725,734,共6页Micronanoelectronic Technology

基　　金：中国博士后基金资助项目(2013M540744);广东省自然科学基金资助项目(S2011040005742;10452902001005900);广东省科技创新项目(2012KJCX0100);江门市科技计划资助项目(2011010049758)

摘　　要：采用紫外纳米压印工艺,在有机发光二极管(OLED)衬底上制备三维立体微结构,可以有效提高器件的出光效率,增加器件发光亮度。而有效实施纳米压印工艺的先决条件是纳米压印模板的制备。首先在沉积有金属Cr薄膜阻挡层(厚度为20 nm)的石英基片上旋涂一层电子敏感光刻胶,然后通过电子束光刻(EBL)技术进行曝光、显影,在光刻胶上形成三维纳米微结构图案。再利用反应离子刻蚀技术和湿法腐蚀技术相结合的方法进行图形的转移,将光刻胶上的纳米微结构转移至石英基片上。通过以上方法制备的纳米压印模板,其微结构具有较好的分布均匀性,可以满足紫外纳米压印技术制备微结构的工艺要求。The three-dimensional microstructures were fabricated on the substrate of the organic light emitting diode （OLED） by the UV nanoimprint process. The performances of optical effi- ciency and brightness can be effectively enhanced. The fabrication of the nanoimprint lithography template is the precondition to effectively implement the nanoimprint process. Firstly, a layer of the electron-sensitive photoresist was coated on the quartz substrate deposited in advance with metal film Cr （thickness of 20 nm） as barrier layer. Secondly, the 3D nano-micro structures were formed by the electron beam lithography （EBL） for exposure and development. Then the nano~ micro structures on the photoresist were transferred to the quartz substrate by the combination technology of reactive ion etching and wet etching. The microstructures on the nanoimprint tem- plates by above methods have the better uniformity to meet the process requirements of fabrica- ting microstructures by the LIV nanoimprint process.

关 键 词：有机发光二极管(OLED) 紫外纳米压印 电子束光刻(EBL) 模板 微结构 

分 类 号：TN405[电子电信—微电子学与固体电子学]