双尺度织构的激光光刻工艺  

Fabrication of two-scale texture by laser lithography

作　　者：贺海东[1] 郝敬宾[1] 赵恩兰[1] 杨海峰[1] 唐玮[1] 朱华[1] 钱济国[1] 

机构地区：[1]中国矿业大学机电工程学院,江苏徐州221116

出　　处：《强激光与粒子束》2013年第11期2900-2904,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(51105360;51205394);江苏省自然科学基金项目(BK2011218);中国博士后科学基金项目(2012T50522);中国博士后项目(2011M500966);江苏省光子制造科学与技术重点实验室开放基金项目(GZ200905);清华大学摩擦学国家重点实验室开放基金项目(SKLTKF10B06)

摘　　要：搭建了双光束激光干涉光刻系统和激光快速扫描系统。利用干涉光刻系统,实现了不同周期、不同深度、大面积的表面规则光栅织构的构筑。利用激光快速扫描器的二维扫描功能,通过控制激光功率和扫描速度,对曝光量和填充线条间距进行了优化。提出了两种双尺度复合织构的制备方法:一种是在激光快速扫描系统中对抗蚀剂表面分别进行x,y方向的扫描光刻,然后在干涉光刻系统中进行双光束干涉光刻;另一种是在激光干涉光刻系统中进行两次曝光,每次曝光的入射角不同。实验结果表明:这两种方法在制备双尺度复合织构方面具有快速、廉价、操作简易等优点。The systems of two-beam interference lithography and laser rapid scanning lithography were constructed. rat ings with different period and depth were fabricated over large areas by laser interference lithography. Utilizing the two-dimen sional scan function of laser rapid scanner, exposure and distance between stuffers were optimized by controlling laser power and scanning speed. Two methods for two scale texture fabrication were presented. The first one was that the photoresist which had been scanned in and y directions by scanning lithography was exposed in interference lithography system. The second one was that photoresist was exposed twice with different incidence angle in interference lithography system. The results show that the two methods were fast, cheap and controllable for two-scale texture fabrication.

关 键 词：双光束干涉 双尺度 表面织构 激光光刻 

分 类 号：TN305.7[电子电信—物理电子学]