射频磁控溅射制备类金刚石薄膜  

Diamond-Like Carbon Deposited by RF Magnetron Sputtering

作　　者：梁志敏[1] 翟建广[1] 张锋[1] 

机构地区：[1]上海工程技术大学材料工程学院,上海201620

出　　处：《上海工程技术大学学报》2013年第3期244-247,共4页Journal of Shanghai University of Engineering Science

基　　金：上海工程技术大学校科研启动资金资助项目(校启2013-07)

摘　　要：采用射频磁控溅射法在Si和Ti合金基体上沉积出类金刚石(DLC)薄膜.利用拉曼光谱仪、划痕仪和扫描电子显微镜分析了DLC薄膜的结构、膜基附着力和表面形貌.结果表明:射频磁控溅射法能够制备出表面平整、结构致密的DLC薄膜;同时基体材料的不同不会影响DLC薄膜的键合结构,Si基体上涂层附着力为30N,Ti基体上膜基结合力大于40N.Diamond-like carbon （DLC） thin films were deposited on Si and Ti alloy substrates by RF magnetron sputtering. The structure, adhesion and surface morphology of DLC film were investigated by the Raman spectrometer, scratch tester, scanning electron microscopy （SEM）. Results show that this method can prepare the DLC film with smooth surface and high density. The different substrates have no effects on the bonding structure,the adhesions on Si and Ti substrates are 30 N and over 40 N respectively.

关 键 词：射频磁控溅射 类金刚石薄膜 膜基结合力 

分 类 号：O484.41[理学—固体物理]