一维版图的快速光刻仿真  

Fast Lithography Simulation for One-Dimensional Layout

作　　者：谢春蕾[1] 史峥[1] 林斌[1] 

机构地区：[1]浙江大学超大规模集成电路设计研究所,浙江杭州310027

出　　处：《光学学报》2013年第11期60-68,共9页Acta Optica Sinica

摘　　要：充分利用光刻系统中光源的部分相干特性和一维图形的特性,提出了针对一维版图的快速平面光刻仿真算法。该方法由一维基元图形查表法、最小查找表及其边缘延伸和无切割的大面积版图仿真组成。仿真结果表明,在保证极高准确性的基础上,相比于传统的快速仿真方法,该方法将查找表的建立时间缩短了95%以上、基本图形的仿真速度提高了48%左右、大面积版图的仿真速度提高了70%以上。One fast lithography simulation methodology is proposed for one-dimensional layout, taking advantage from the characteristics of partial coherent system and one-dimensional pattern. The new methodology consists of look-up table based on one-dimensional basis pattern, the minimum look-up table and its boundary extension, and simulation of large scale layout without division. Simulation and experiment results show that comparing the new algorithm with conventional method, the building time of look-up table is reduced by more than 95%, the simulation speed for basic pattern improves by about 48% and the simulation speed for large scale layout improves by more than 70% based on high accuracy.

关 键 词：成像系统 光刻 光刻仿真 一维版图 

分 类 号：TN305.7[电子电信—物理电子学]