X光单级衍射光栅的研究进展  

Recent Developments in X-ray Single-order Diffraction Gratings

作　　者：黄成龙[1,2] 张继成[1] 易勇[2] 曹磊峰[1] 王红斌[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,绵阳621900 [2]西南科技大学材料科学与工程学院,绵阳621010

出　　处：《材料导报（纳米与新材料专辑）》2013年第2期164-167,178,共5页

基　　金：四川省非金属复合与功能材料重点实验室开放基金(11zxfk19)

摘　　要：介绍了单级衍射光栅的应用背景及其基本理论,分析了单级衍射光栅与传统黑白透射光栅的不同之处。阐述了单级衍射光栅的制作技术,分析了以电子束光刻、X射线光刻和微电镀技术为主的工艺路线的优缺点。综述了X光单级衍射光栅的发展历程以及存在的问题,并指出了其未来的研究方向。The application background and basic theory of single-order diffraction grating are introduced,and the differences between single-order diffraction grating and conventional black-white transmission grating are analyzed.The fabrication techniques of single-order diffraction grating are analyzed,the merits and demerits of electron beam lithography,X-ray lithography and microplating are discussed.At last,the development history and problems of X-ray single-order diffraction grating are reviewed,and its potential prospect is proposed.

关 键 词：X光单级衍射光栅 黑白透射光栅 电子束光刻 X射线光刻 

分 类 号：O436[机械工程—光学工程]