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作 者:詹如娟[1,2] 吴丛凤[1,2] 温小辉[1,2] 朱晓东[1,2] 周海洋[1,2]
机构地区:[1]中国科学技术大学结构分析开放实验室,合肥 230026 [2]中国科学技术大学近代物理系,合肥 230026
出 处:《真空科学与技术》2001年第1期30-33,共4页Vacuum Science and Technology
基 金:国家自然科学基金资助项目(69493500,19835030,19875053)
摘 要:报道了所研制的Waveguide surfatron型表面波等离子体源的特性 ,理论计算表明 ,激发表面波模式为m≥l模 ,在放电室中电磁场均匀性与等离子体的密度有关。实验结果指出 ,采用Ar气放电 ,在气压为 10~ 10 0 0Pa ,微波功率 80 0~ 10 0 0W的范围内可形成大面 (体 )积 (直径为 16 0mm)等离子体 ,其电子温度为 1~ 4eV ,等离子体密度为 10 10 ~ 10 11cm-3 量级 ,实测的等离子体密度与理论计算值基本吻合。A novel plasma source has been successfully developed for surface waves excited by the waveguide surfatron and its charac teristics was studied.The theoretical analyses show that the modes of the surface wave are greater than l,( m ≥l),and the uniformity of the electromagnetic field in the discharge chamber depends on the plasma density.Experimental results show that large size(with a diameter over 160 mm)uniform plasma can be produced at a pressure of 10~1000 Pa with a microwave power of 800~1000 W for argon gas.The plasma density is 10 10 ~10 11 cm -3 with electron temperature lower than 4 eV.In a typical pressure ranging from 10 to 230 Pa with a microwave power of 800 and 900 W,the measurement of the plasma densities is in good agreement with the calculation.
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