SAT与SST在半导体清洗工艺中的应用  

Application of SAT and SST bench on the semiconductor process

作　　者：关宏武[1] 冯小强[1] 段成龙[1] 宋伟峰[1] 舒福璋[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所第二事业部,北京101601

出　　处：《清洗世界》2014年第2期8-10,19,共4页Cleaning World

摘　　要：针对芯片制造商对设备低投入高产出的要求,介绍了能将多种工艺集成在一起的工作台SAT(喷酸系统)与SST(喷雾溶剂系统),详细介绍了其工作原理及特点,并与清洗机+甩干机传统清洗及刻蚀方式进行了详细对比,根据厂商实际使用效果,可以看出这两种集成工作台可以有效降低成本,提高生产效率。Aiming at fab＇ s request of low cost and high product, the Spray Acid Tool（SAT） and Spray Solvent Tool（SST） bench that can integrate several kinds of semiconductor processes are introduced in the paper, the work principle and character of the two bench are also depicted amply. The more compare between SST, SAT and rinse bench ＋ spray rotate dryer that are traditional rinse and etch method, combining the real using result in lab, the result can be seen,that is the both benches can re- duce the cost and improve the manufacure efficiency.

关 键 词：SAT SST 刻蚀 去胶 

分 类 号：TN305.97[电子电信—物理电子学]