不同衬底温度对ZnO薄膜结构和光学性质的影响  

Effect of Substrate Temperature on Crystalline Characteristics and Optical Properties of ZnO Thin Films

作　　者：贾相华[1] 黄海亮[1] 付斯年[1] 朱瑞华[1] 左桂鸿[1] 曹洪忠[1] 李月英[1] 

机构地区：[1]牡丹江师范学院黑龙江省新型碳基功能与超硬材料重点实验室,黑龙江牡丹江157001

出　　处：《哈尔滨理工大学学报》2014年第1期108-111,共4页Journal of Harbin University of Science and Technology

基　　金：牡丹江师范学院科学技术研究项目(QC200904);黑龙江省教育厅科学技术研究项目(12521577)

摘　　要：利用磁控溅射在玻璃基片上制备了不同衬底温度下的ZnO薄膜.借助X射线衍射仪(XRD)、吸收光谱、光致发光谱(PL)等手段研究了衬底温度对ZnO薄膜的微结构、光致发光性能的影响.结果表明:所有样品均呈现ZnO六角纤锌矿结构且具有高度c轴择优取向;ZnO薄膜在可见区的吸收系数很小,在紫外区有很高的吸收系数;室温下的荧光光谱显示薄膜具有较强的紫光发射.Abstract：ZnO thin films were deposited on glass substrates under different substrate temperatures by rf reac- tive sputtering. We have studied the influence of growth temperature on microstructural,photoluminescence proper- ties of ZnO thin films of by X-ray diffraction（XRD）, absorption spectrum,photoluminescence speetrum（PL）. The results indicate that ZnO thirl films exhibits a hexagonal wurtzite structure with preferred c-axis orientation： absorp- tion coefficient of the ZnO films in the visible region very small, with absorption coefficient is very high in the ultra- violet region; photoluminescence spectra show that the thin films have strong emission of and violet light.

关 键 词：ZNO薄膜 衬底温度 光致发光谱 

分 类 号：TN304[电子电信—物理电子学]