管状构件内表面真空镀膜方法研究进展  

Progress on the Study of Vacuum Coating Methods for the Inner Surface of Tubular Workpiece

作　　者：赵彦辉[1] 贾莹[2] 于宝海[1] 肖金泉[1] 

机构地区：[1]中国科学院金属研究所专用材料与器件研究部,沈阳110016 [2]沈阳鼓风机集团股份有限公司,沈阳110869

出　　处：《表面技术》2014年第2期118-125,149,共9页Surface Technology

基　　金：国家自然科学基金资助项目(51171197)~~

摘　　要：综述了国内外真空镀膜方法,包括化学气相沉积与物理气相沉积方法对管状构件内表面镀膜的研究进展,介绍了热化学气相沉积及各种等离子体(包括直流、射频及电子自旋共振等离子体)增强化学气相沉积方法在管状构件内表面镀膜方面的应用,分析了这种方法的优缺点;重点阐述了溅射镀膜方法 (包括直流二极(或三极)溅射、磁控溅射及离子束(或激光束)溅射)及电弧离子镀技术在管状构件内表面镀膜时对薄膜种类、沉积速率、薄膜厚度轴向均匀性、膜/基结合力等方面的特点。最后对管状构件内表面各种真空镀膜方法进行了分析对比,指出了存在的问题及今后的发展方向。In this paper, research progress of vacuum coating methods including physical vapor deposition （PVD） and chemical vapor deposition （CVD） were reviewed for the inner surface protection of tubular workpieces. Thermal CVD and various kinds of plasma-enhanced CVD （PECVD）including direct current plasma, radio-frequency plasma and electron spin resonance （ECR） plasma were introduced, and the advantages and disadvantages of these methods were analyzed. The study was mainly focused on the effects of sputtering method （including direct current diode （tripolar） sputtering, magnetron sputtering and ion beam （laser beam） sputtering） and arc ion plating technique for the inner surface coating of tubular workpieces on the film type, film deposition rate, axial uniformity of film thickness and film/substrate adhesion, etc.. Finally, the CVD and PVD methods for the inner surface coating of tubular workpieces were analyzed and compared, and the existing problems at present and developing direction in the fu- ture were presented.

关 键 词：管状构件 内表面 物理气相沉积 化学气相沉积 

分 类 号：TG174.444[金属学及工艺—金属表面处理] TB43[金属学及工艺—金属学]