微波等离子体化学气相沉积法制备石墨烯的研究进展  

STUDY OF GRAPHENE PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

作　　者：涂昕[1] 满卫东[1] 游志恒[1] 阳朔 

机构地区：[1]武汉工程大学湖北省等离子体化学与新材料重点实验室,湖北武汉430073

出　　处：《真空与低温》2014年第2期63-70,76,共9页Vacuum and Cryogenics

基　　金：湖北省自然科学基金:11104211;武汉工程大学第四届研究生创新基金项目:CX201236

摘　　要：微波等离子体化学气相沉积(MPCVD)法具有低温生长、基底材料选择广泛、容易掺杂等优点,是大面积、高速率、高质量石墨烯制备的首选。首先通过比较制备石墨烯的几种主要CVD方法得出MPCVD法的优势,然后阐述了MPCVD法制备石墨烯的研究,最后介绍了MPCVD法制备的石墨烯的应用并对MPCVD法制备石墨烯的发展趋势进行了展望。Due to its advantages by low-temperature growth, a widely selection of the substrate materials and easily doped, microwave plasma chemical vapor deposition （MPCVD） is the first choice of the grapheme prepration by large area, high speed,high quality. The several main CVD methods for synthesizing grapheme are compared. It found out that MPCVD has clear superiority. Then the study of graphene prepared by MPCVD is expatiated. Lastly the application of graphene pre- pared by MPCVD is introduced and also the development trend of graphene prepared by MPCVD is prospected.

关 键 词：微波等离子体化学气相沉积 石墨烯 研究 应用 

分 类 号：O484[理学—固体物理]