一种下限为1.3×10^(-14)Pa·m^3/s的真空漏孔校准装置  

A Novel Vacuum Leak Calibration Apparatus with Lower Limit of 1. 3 × 10^(-14)Pa·m^3/s

作　　者：卢耀文[1,2] 陈旭[1] 李得天[2] 齐京[1] 刘波 闫睿[1] 查良镇[1] 

机构地区：[1]清华大学,北京100084 [2]兰州物理研究所,兰州730000 [3]西安航天计量测试研究所,西安710100

出　　处：《真空科学与技术学报》2014年第5期504-509,共6页Chinese Journal of Vacuum Science and Technology

摘　　要：为了解决漏率小于10-12Pa·m3/s漏孔的校准问题,提出累积法与固定流导法相结合的方法,研制出下限可达10-14Pa·m3/s量级的校准装置。装置主要由累积比较系统和固定流导法流量计组成,采用四极质谱计作为比较器测量示漏He气离子流大小,通过累积的方法解决了质谱分析室中示漏气体分压力测量问题;采用激光打孔和多次镀膜的方式获得10-10m3/s量级的分子流导,用吸气剂泵将真空室本底压力维持在10-7Pa量级,使磁悬浮转子真空计对固定流导元件入口He气压力测量下限可达10-4Pa,从而获得下限为1.3×10-14Pa·m3/s的标准气体流量。研究结果表明,装置采用He气作为示漏气体的校准范围为10-12~1.3×10-14Pa·m3/s,合成标准不确定度为5.2%~5.8%。A novel type of vacuum leak calibration apparatus,based on accumulation and constant conductance methods and with a lower limit of 1. 3 × 10^- 14Pa·m^3/ s,was developed to calibrate leakage rates lower than 10^- 12 Pa·m^3/ s. The newly-developed leak device mainly consists of an accumulation comparion system and a flow-meter based constant conductance; the partial pressure is measured in accumulation method and a quadrupole mass-spectrometer,as the comparator,evaluates the leakage gas（ He）. Fabricated by laser-drilling and multiple coating,the constant conductance component（ C0） provides a molecular flow conductance as low as 10^- 10m^3/ s. Since a non-evaporable getter pump lowers the base pressure to 10^- 7Pa,the lower limit of the pressure at C0＇s inlet is reduced to 10^- 4Pa,measured with a spinning rotor gauge. Consequently,the standard lower limit flow is decreased to 1. 3 × 10^- 14Pa·m^3/ s. The test results show that the calibration apparatus covers the range of 10^- 12～ 1. 3 × 10^- 14Pa· m^3/ s（ He）,and that the combined standard uncertainty is 5. 2% ～ 5. 8%.

关 键 词：累积法 固定流导法 真空漏孔 漏率 

分 类 号：TB77[一般工业技术—真空技术]