化学气相沉积法制备金刚石薄膜的工业应用  

Industrial Applications of Chemical Vapor Deposition Diamond Films

作　　者：马志斌[1] 邬钦崇[1] 汪建华[2] 

机构地区：[1]中国科学院等离子体物理研究所,合肥230031 [2]武汉化工学院材料工程系等离子体技术与薄膜材料实验室,武汉430073

出　　处：《材料导报》2001年第3期24-27,共4页Materials Reports

摘　　要：评述了金刚石薄膜的化学气相沉积方法。介绍了金刚石薄膜在工业中的应用前景,并分析了大规模应用所面临的技术困难。The methods of preparing diamond films by chemical vapor deposition were reviewed.The prospects of industrial applications of diamond films were discussed and the technological difficulties encountered in large scale applications were analyzed.

关 键 词：金刚石薄膜 化学气相沉积 工业应用 制备 性质 

分 类 号：TB43[一般工业技术] O484[理学—固体物理]