离子束轰击对芦荟细胞壁结构的损伤效应  

Ion Beam Bombardment Effects on the Microstructure of the Aloe Cell Wall

作　　者：尧俊英[1] 冯昕[1] 李景原[2] 

机构地区：[1]郑州轻工业学院食品与生物工程学院,中国河南郑州450002 [2]郑州大学河南省离子束生物工程重点实验室,中国河南郑州450052

出　　处：《生命科学研究》2014年第3期195-198,共4页Life Science Research

摘　　要：利用扫描电镜、透射电镜方法,观察氮离子束注入对芦荟细胞壁结构的影响。扫描电镜观察结果显示,在离子注入剂量达1×1016N+/cm2时,叶片表面发现了离子束刻蚀的小洞。透射电镜半薄切片观察也发现离子束轰击后,芦荟叶片表皮的横切面都有不同程度被打烂的情况,初步认为是离子束轰击引起的刻蚀效应,这与扫描电镜的观察结果相一致。研究结果可为离子束介导转基因技术的研究提供参考。The effects of ion beam bombardment on the microstructure of the Aloe cell wall were observed by scanning electron microscope （SEM） and transmission electron microscope （TEM）.The SEM results showed that, when the dose of ion beam increased to 1×10^16N^＋/cm^2,the spatter trace and small holes were founded on the leaf epidermis. The results of the Aloe leaf epidermis transverse section （treated by ion beam） also showed that the epidermis were broken in different degree ,while the control group were smooth. It was considered that the etching effect was caused by ion bombardment. The results are in accordance with the SEM and can provide reference to the study of gene transfer mediated by ion beam.

关 键 词：离子束 芦荟 扫描电镜 透射电镜 

分 类 号：Q336[生物学—遗传学]