荷能团簇束成膜的表面迁移和附着特性的研究  

A study on the properties of surface migration and adhesion during energetic cluster impact deposition

作　　者：俞国庆[1] 石瑛[1] 欧阳振乾[1] 陈景升[1] 张志滨[1] 朱德彰[1] 潘浩昌[1] 徐洪杰[1] 

机构地区：[1]中国科学院上海原子核研究所核分析开放实验室,上海201800

出　　处：《核技术》2001年第2期81-84,共4页Nuclear Techniques

基　　金：国家自然科学基金!(19675062);中国科学院基础研究局资助

摘　　要：研究了不同能量的团簇碰撞有机物（ＣＨ３ＳｉＯ３／２）衬底形成的表面形貌。结果表明，团簇能量的增大，增加了团簇原子在基片表面的有效碰撞能和迁移力，也改善了沉积薄膜的附着性、致密性、平整性等。特别是有机物上修饰条纹的出现，是迁移力增加的有力证据。The surface morphology of organic material (CH3SiO3/2 ) bombarded by energetic cluster beam was investigated by Atomic Force Microscopy (AFM). The results showed that the migration and adhesion of cluster constituent atoms on the surface would be improved if the cluster energy gradually increased, accordingly improving the quality of film. Especially, the existence of convex stripes on the surface indicated the diffusion ability increased with the increasing cluster energy.

关 键 词：原子力显微镜 迁移性 附着性 有机硅化合物 荷能团簇束成膜 

分 类 号：O484[理学—固体物理]