步进光刻机中的成像线宽控制  

The Image Line Width Control in Stepper

作　　者：周虎明[1] 

机构地区：[1]江苏无锡信息产业部电子第五十八研究所,江苏无锡214035

出　　处：《电子工业专用设备》2001年第1期27-33,共7页Equipment for Electronic Products Manufacturing

摘　　要：线宽控制是光刻质量的关键。以 0 8～ 1 0 μmIC电路生产为依据 ,讨论光刻机特性影响成像线宽的因素以及使用中的最佳调整。In the optical lithography printing system, the image line width control is the key issues of the quality for photolithography. It will be discussed how the performance of the stepper does influence the image line width and how the stepper will be optimal adjusted during the operation. All discussion in the article is concemed only with the fabrication of 0.8～1.0μm IC.

关 键 词：步进光刻机 线宽控制 线宽误差 半导体 

分 类 号：TN305.7[电子电信—物理电子学]