MWPCVD制备金刚石膜装置的大功率稳定运行的研究  

Study of Steady Operation of the MWPCVD Apparatus for Diamond Films Deposition on Heavy -Duty

作　　者：舒兴胜[1] 邬钦崇[1] 

机构地区：[1]中国科学院等离子体物理研究所,合肥230031

出　　处：《高技术通讯》2001年第7期88-90,共3页Chinese High Technology Letters

基　　金：863计划资助项目 (863-715- 002-0020)

摘　　要：介绍了水冷反应室式MWPCVD制备金刚石膜装置的结构和工作原理 ,着重讨论了该装置长时间大功率稳定运行的措施。该装置在微波输入功率为 3 0kW时能长时间稳定运行。The setup and the operation theory of the reaction chamber water cooled MWPCVD apparatus for diamond films deposition is concisely presented, and the method for its steady operation on heavy duty for a long period of time is emphatically discussed The MWPCVD apparatus can steadily operate for a long period of time on the condition of 3 0kW input microwave power The diamond films are successfully prepared on silicon substrates in this apparatus

关 键 词：MWPCVD装置 稳定运行 微波功率 金刚石膜 薄膜制备装置 结构 

分 类 号：TN304[电子电信—物理电子学]