在有机玻璃上射频溅射ITO组合薄膜  

Deposit ITO coatings on PMMA substrate by RF magnetic sputter

作　　者：高劲松[1] 孙连春[1] 郑宣明[1] 王哲[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,吉林长春130022

出　　处：《光学技术》2001年第6期501-502,共2页Optical Technique

摘　　要：利用射频磁控溅射技术在有机玻璃表面上一次完成表面活化、ITO膜制备、SiO2 减反射膜制备过程。利用低能等离子体对有机玻璃表面进行改性以提高ITO膜的附着力。研究了氧分压等工艺参数对ITO膜导电性能及光学性能的影响。By using RF magnetic sputter technology, a series of process in one time, which include the process of surface reconstruct on PMMA & the deposition process of ITO coating and antireflection coating, are completed. The surface reconstruct via bombardment of low energy plasma in order to enhance the adhesion between ITO coatings and substrate of PMMA is finished. The influence of O 2 pressure and other parameters on optical and electrical feather of ITO coatings is studied.

关 键 词：ITO膜 射频磁控溅射 表面改性 低温成膜 有机玻璃 

分 类 号：O484.41[理学—固体物理]