惯性约束聚变实验用平面薄膜的制备及其表面图形的引入  

PREPARATION OF THIN FOILS AND PATTERN TRANSFER ININERTIAL CONFINEMENT FUSION EXPERIMENTS

作　　者：周斌[1] 王珏[1] 沈军[1] 徐平[1] 吴广明[1] 邓忠生[1] 孙骐[1] 艾琳[1] 陈玲燕[1] 韩明[2] 熊斌[2] 王跃林[2] 

机构地区：[1]同济大学波耳固体物理研究所,上海200092 [2]中国科学院上海冶金研究所传感器国家重点实验室,上海200050

出　　处：《物理》2001年第11期707-711,共5页Physics

基　　金：国家"八六三"高技术计划惯性约束聚变领域资助项目

摘　　要：平面薄膜是ICF分解实验的重要靶型 .以半导体技术结合重掺杂自截止腐蚀制备厚度为 3— 4μm的Si平面薄膜 ,以热蒸发结合脱膜工艺制备Al平面薄膜 ,两者的表面粗糙度分别为 30nm和 10nm左右 ;进一步采用离子束刻蚀在平面薄膜的表面引入网格或条状图形 ,获得测量成像系统像传递函数的刻蚀膜 。Thin foils are important targets used in inertial confinement fusion experiments. Thin silicon foils with a thickness of 3 to 4 micrometers and a surface roughness of several tens of nanometers were prepared by a semiconductor process together with a self-stopping etching process. Thin aluminum foils with thickness about 1 micron thick and with a surface roughness of about 10 nanometers were prepared by evaporation together with a foil removal process. Through an ion beam etching process, a checked or striped pattern was transferred to the surface of the thin silicon and aluminum foils, to produce the grating foils. The parameters of the ion beam etching process could be varied to control the pattern transfer precision.

关 键 词：平面薄膜 离子束刻蚀 惯性约束聚变实验 表面图形 制备 

分 类 号：O484[理学—固体物理]