用于辅助镀膜的霍尔等离子体源  

The hall accelerater for assisted deposition

作　　者：尤大伟[1] 黄小刚[1] 武建军[1] 

机构地区：[1]中国科学院空间科学与应用研究中心,北京100080

出　　处：《光学仪器》2001年第5期58-62,共5页Optical Instruments

摘　　要：论述了该源的工作原理 ,讨论并测试了该源最佳的磁场及分布。设计采用了永久磁铁并利用极靴产生发散磁 ,沿轴向有较大梯度的磁场 ,又称该源为端部霍尔加速器。The design of the hall accelerater and the optimum magnetic structure were presented. The permenent magnet was applied. The pole pieces were arranged to obtain the divergent magnetism and strong magnetism gradient along axial direction. The design gives us a good results.

关 键 词：光学镀膜 离子束辅助镀膜 等离子体加速 

分 类 号：O484.41[理学—固体物理] TB43[理学—物理]