X射线激光自支撑Mo滤光膜的制备及特性研究  

Preparation and characterization of free-standing molybdenum filter for x-ray laser

作　　者：吴永刚[1] 曹二华[1] 王占山[1] 魏军明[1] 顾春时[1] 唐伟星[1] 陈玲燕[1] 

机构地区：[1]同济大学波耳固体物理研究所,上海200092

出　　处：《光学仪器》2001年第5期144-148,共5页Optical Instruments

摘　　要：用直流平面磁控溅射方法在抛光玻璃衬底上淀积 Mo薄膜 ,将薄膜在真空环境中进行热处理 ,用扫描探针显微镜 ( SPM)方法观察了薄膜的表面形貌 ,X-射线衍射方法分析了薄膜中应力各向异性特征及其与淀积时溅射气体压强和真空热处理的关系。发现薄膜中晶粒具有明显的择优取向 ,内应力沿径向对称分布 ,切向应力比径向应力更具有压应力特性 ,应力的各向异性特征与溅射原子的入射方向有关。真空热处理对薄膜中压应力的释放作用不明显 ,然而能有效地释放薄膜中的张应力。用 HF酸腐蚀衬底的方法制备了自支撑 Mo薄膜 ,发现脱膜前后薄膜表面微观形貌未产生大的变化。Molybdenum films were deposited onto polished glass substrates with dc circular planar magnetron sputtering,and annealed in vacuum.Scan probe microscopy was applied to observe the morphology of the films,X ray diffractometry was used to analyze internal stress anisotropy and its relation with the deposition working gas pressure.Preferred orientation of the (110)plane parallel to the surface was found in the films,the stress in the tangential direction was more compressive than that in the radial direction,the stresses anisotropy in the films were related to the incident direction of the deposition species.Annealing the films in vacuum could hardly release the compressive stress,but can effectively release the tensile stress.Free standing Mo films were obtained by chemically etching the un masked substrates,the morphology of the films before and after peeling off didn't show great difference.

关 键 词：磁控溅射 表面形貌 应力 自支撑 钼薄膜 滤光膜 

分 类 号：O484.41[理学—固体物理] TB43[理学—物理]