双能级离子束合成氮化类金刚石试验研究  

Synthesis Nitrogenated Diamondlike Carbon by High-and Low-Energy Ion Beam Bombardment

作　　者：陈祝平[1] 王可寰[1] 

机构地区：[1]煤炭科学研究总院,北京100013

出　　处：《徐州建筑职业技术学院学报》2001年第1期25-27,34,共4页Journal of XUZHOU Institute of Architectural Technology

摘　　要：以 2 5 0～ 5 0 0eV的低能离子束轰击溅射石墨靶在钢上沉积非晶态碳膜 ,再以 2 5～ 35keV的高能离子束将离化的双原子分子氮注入非晶态碳膜 .纳米硬度分析表明了离子注氮后的硬度从2 0～ 30GPa提高到 2 7～ 4 2MPa范围 ;激光拉曼谱显示 ,膜的结构仍为非晶态 ,但所有拉曼参数发生变化 ,说明氮和碳形成化学键 ;X光电子能谱进一步揭示了氮注入碳后 ,氮峰位化学位移变化 ,隐示新相形成的可能性 .结论 :氮离子注入可形成氮化的类金刚石 ;Ionized nitrogen was implanted with high energy between 25～35 keV into amorphous carbon films which were previously deposited on steel substrate by ion beam sputtering at a graphite target with low energy between 250～500 eV.Nano indentation results show that there is an increase in hardness from 20～30 GPa up to 27～43 GPa after ion implantation.As revealed by Raman spectroscopy,the amorphous structure of the films is unchanged by ion implantation,while those Raman parameters sensitive to bonding structure are affected,suggesting the formation of chemical bonding between nitrogen and carbon atoms.Significant chemical shift on both C 1s and N 1s core level peaks was found by using XPS analysis,which strongly suggests the formation of new phase after ion implantation.It can be concluded that implanting nitrogen leads to nitrogenated diamondlike carbon,and with low and high energy ion beam bombardment properties modification on DLC films can be achieved.

关 键 词：离子注入 类金刚石 离子束氮化 双能级离子束 轰击技术 氮化碳 试验研究 非晶态碳膜 薄膜 

分 类 号：TG174.444[金属学及工艺—金属表面处理] O484.1[金属学及工艺—金属学]