光瞳滤波投影光刻实验研究  

Experimental Study on Pupil Filtering Projection Photolithography

作　　者：石建平[1] 陈旭南[1] 康西巧[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209

出　　处：《微细加工技术》2002年第1期22-26,共5页Microfabrication Technology

基　　金：国家自然科学基金资助项目 (6 9876 0 4 1)

摘　　要：介绍了一套自行研制的用于光瞳滤波实验的投影光刻实验系统 ,其物镜光瞳处预留出放滤波器的位置 ,可方便取放滤波器。在理论分析的基础上 ,开展了光刻对比实验研究 ,实验研究结果表明 ,光瞳滤波能大幅度提高投影光刻成像系统分辨力 ,并增大焦深 。A set of projection photolithography system designed by ourselves for the pupil filtering experiment is presented. In the system a place at the object lens, where the filter can be easily put in or taken off, is prepared. Based on the theoretical studies the compared photolithography experiments are done. The experiment results show that the pupil filtering can obviously improve the resolution of optical projection photolithography system and increase the DOF at the same time. So the pupil filtering is one of the effective technologies to improve the photolithography image quality.

关 键 词：投影光刻 实验研究 光刻系统 光瞳滤波 分辨力 焦深 

分 类 号：TN305.7[电子电信—物理电子学]