离子轰击引起的表面形貌对Ag的溅射产额的影响  

INFLUENCE OF SURFACE TOPOGRAPHY ON THE SPUTTE RING YIELDS OF SILVER

作　　者：潘冀生[1] 王震遐[1] 陶振兰[1] 章骥平[1] 张慧明[2] 赵烈[2] 

机构地区：[1]中国科学院上海原子核研究所,上海201800 [2]杭州大学中心实验室,杭州310028

出　　处：《物理学报》1991年第12期2018-2023,共6页Acta Physica Sinica

基　　金：国家自然科学基金资助的课题

摘　　要：用捕获膜技术和卢瑟福背散射(RBS)谱仪测定Ag靶在27keV Ar^+离子轰击下的溅射原子角分布,从而确定不同剂量下Ag的溅射产额,并对其靶点表面形貌进行扫描电子显微镜(SEM)观察。结果发现,所有的角分布都呈over-cosine形状,但其溅射产额却随着表面形貌不同而不同。根据溅射产额Y与轰击离子入射角φ变化关系,讨论不同轰击剂量下溅射产额的差别,肯定了表面形貌是影响溅射产额的一个重要因素,并由此提出“表观产额”的新概念。The angular distributions and yields of silver atoms sputtered from a Ag sample have been measured using collector technique and RBS analysis. The Ag target was sputtered at normal incidence with 27keV Ar+ ions. The irradiated surface was examined by scanning electron microscopy. It was found that all the angular distributions were over-cosine with different irradiation dose, but the sputtering yields were dose-dependent. The experimental result can be explained with surface topography and sputtering yield as a fuction of the angle of incidence. It is found that surface topography seems to be an important factor to influence sputtering yield. a new concept, namely 'apparent yield', is presented.

关 键 词：离子轰击 表面形貌 AG 溅射产额 

分 类 号：TN305.92[电子电信—物理电子学]