离子束辅助沉积碳膜抑制栅电子发射研究  

Electron Emission Suppression Characteristics of Molybdenum-Grid Coated with Carbon Film by Ion Beam Assisted Deposition

作　　者：柳襄怀[1] 任琮欣[1] 江炳尧[1] 朱宏[1] 刘炎源[2] 刘静贤 

机构地区：[1]中国科学院上海微系统与信息技术研究所离子束重点实验室,上海200050 [2]中国科学院电子学研究所,北京100080

出　　处：《电子学报》2002年第5期661-663,共3页Acta Electronica Sinica

基　　金：〈8 63〉国家高技术研究计划基金(No .71 5 0 0 8 0 0 1 1 );〈973〉重大项目基金研究基金 (No .G2 0 0 0 0 672 0 7 2 )

摘　　要：本文利用离子束辅助沉积方法在钼栅极的表面镀上一层碳膜 ,采用模拟二极管的方法测量阴极活性物质Ba、BaO蒸发沉积在镀碳钼栅与纯钼栅表面后的电子发射性能 .测量结果表明 ,镀碳钼栅的电子发射量显著减少 .依据XPS、电子探针对钼栅极表面阴极发射物的分析结果 。Carbon was coated on the surface of molybdenum grids by ion beam assisted deposition(IBAD).Electron emission characteristics from the grids with and without carbon contaminated by active electron emission substance of the cathode were measured using analogous diode method.The results show that electron emission from the grid with carbon was much less than that from the grid without carbon.The cathode emission substance deposited on the carbon surface of the grid was analyzed by XPS and electron probe (EPMA) and the mechanism for suppression of electron emission of the grid with carbon is discussed.

关 键 词：碳膜抑制栅 电子发射 钼栅极 离子束辅助沉积 行波管 

分 类 号：TN124[电子电信—物理电子学]