原子光刻用亚稳态氖原子束源的研究  

Study on Metastable Neon Beam Source Used for Atom Lithography

作　　者：霍芸生[1] 蔡惟泉[1] 曾庆林[1] 鄢和明[1] 王育竹[1] 

机构地区：[1]中国科学院上海光学精密机械研究所量子光学开放实验室,上海201800

出　　处：《中国激光》2002年第1期40-42,共3页Chinese Journal of Lasers

基　　金：国家自然科学基金 (No .197740 6 0 )资助项目

摘　　要：研制了一台用于原子光刻的亚稳态氖原子束源 ,其束流强度可达 3 3× 10 14 atoms/s·Sr.。研究了束流强度的变化规律 ,并对其机理进行了探讨。A neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3×10 14 atoms/s·Sr. was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed.

关 键 词：原子光刻 惰性气体 亚稳态 原子束 束流强度 氖原子 

分 类 号：TN305.7[电子电信—物理电子学]