离子束辅助磁控溅射沉积TiN薄膜的研究  

Ion-beam Assisted Magnetron Sputtering Deposition of Titanium Nitride Films

作　　者：黄鹤[1] 王学刚[1] 朱晓东[1] 陈华[1] 何家文[1] 

机构地区：[1]西安交通大学,陕西西安710049

出　　处：《稀有金属材料与工程》2002年第3期205-208,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金资助项目 (5 99710 3 5 )

摘　　要：利用三离子束辅助沉积设备 ,以离子束辅助沉积、磁控溅射和离子束辅助磁控溅射几种工艺在GCr15基体上沉积TiN薄膜。实验结果表明 :离子束辅助磁控溅射有效地提高了薄膜的硬度、耐磨性和耐蚀性 ,改善了膜基结合力。Titanium nitride films were deposited by ion beam assisted deposition, magnetron sputtering and ion-beam assisted magnetron sputtering deposition on GCr15 and Si substrate. The structure and mechanical properties such as micro-hardness, bonding strength, wear resistance were studied as well as the corrosion resistance. The results show that the hardness, bonding strength and wear resistance of the titanium nitride films deposited by ion-beam assisted magnetron sputtering are increased greatly and the corrosion resistance of films is also improved.

关 键 词：离子束辅助磁控溅射沉积 结合强度 磨损 氮化钛薄膜 

分 类 号：TB43[一般工业技术]