退火温度对原子层沉积法制备ZnMgO薄膜结构和光学性能的影响  

Effects of Annealing Temperature on the Structure and Optical Properties of ZnMgO Films Prepared by Atom Layer Deposition

作　　者：孙冬晓[1] 李金华[1] 方铉[1,2] 陈新影[1] 方芳[1] 楚学影[1] 魏志鹏[1,2] 王晓华[1] 

机构地区：[1]长春理工大学理学院,吉林长春130022 [2]国际纳米光子学与生物光子学联合研究中心,吉林长春130022

出　　处：《光谱学与光谱分析》2014年第7期1789-1792,共4页Spectroscopy and Spectral Analysis

基　　金：国家自然科学基金项目(61006065;61076039;61204065;61205193;61307045);高等学校博士学科点专项科研基金项目(20102216110001;20102216120002;20112216120005);吉林省自然科学基金项目(20101546);吉林省科技发展计划项目(20121816;201201116);吉林省教育厅项目(2011JYT05;2011JYT10;2011JYT11);高功率半导体激光国家重点实验室基金项目(9140C310101120C031115);长春市国际科技合作计划项目(2010CC02);吉林农业大学科研启动基金项目(201238)资助

摘　　要：针对目前关于退火温度对原子层沉积法(ALD)制备ZnMgO薄膜晶体结构和光学性质影响鲜有报道的现象,进行了相应的实验研究分析。采用ALD在石英衬底上制备ZnMgO合金薄膜,对制得的样品在空气中进行不同温度的退火处理。利用X射线多晶衍射仪(XRD)、光致发光谱(PL)和紫外可见(UV-Vis)吸收光谱测试,系统的分析了不同退火温度对ALD法制备ZnMgO薄膜晶体结构和光学性能的影响。XRD测试结果表明:退火温度为600℃时,薄膜的晶体质量得到改善,且(100)衍射峰的强度明显增强。结合PL和UV-Vis吸收光谱的测试分析得出:退火温度为600℃时,能明显促进薄膜中Mg组分的增加使薄膜的禁带宽度进一步增大。从而说明适当温度的退火处理可有效的改善ZnMgO薄膜的晶体质量及光学特性。In the present paper ,we report the research on the effects of annealing temperature on the crystal quality and optical properties of ZnMgO films deposited by atom layer deposition （ALD） .ZnMgO films were prepared on quartz substrates by ALD and then some of the samples were treated in air ambient at different annealing temperature .The effects of annealing temperature on the crystal quality and optical properties of ZnMgO films were characterized by X-ray diffraction （XRD） ,photoluminescence （PL） and ultraviolet-visible （UV-Vis） absorption spectra .The XRD results showed that the crystal quality of ZnMgO films was significantly improved when the annealing temperature was 600 ℃ ,meanwhile the intensity of （100）diffraction peak was the strongest .Combination of PL and UV-Vis absorption measurements showed that it can strongly promote the Mg content increas-ing in ZnMgO films and increase the band gap of films .So the results illustrate that suitable annealing temperature can effectively improve the crystal quality and optical properties of ZnMgO films .

关 键 词：原子层沉积 ZNMGO薄膜 退火温度 

分 类 号：O439[机械工程—光学工程]