光致抗蚀剂的应用及其相关研究  

Application and Research for Photoresist

作　　者：孟磊[1] 徐娜[2] 

机构地区：[1]吉林化工学院理学院,吉林吉林132022 [2]吉林化工学院材料科学与工程学院,吉林吉林132022

出　　处：《吉林化工学院学报》2014年第7期75-78,共4页Journal of Jilin Institute of Chemical Technology

摘　　要：光致抗蚀剂是制作超大规模集成电路的关键性材料之一,随着集成电路产业对集成度要求的不断提高,对于光致抗蚀剂的研究也不断深入.本文综述了光致抗蚀剂类型及应用,对于几种常用紫外光致抗蚀剂进行了阐述,并对其特性和适用范围做了简单介绍.Photoresist is one of the key materials of very large scale integrated circuit. With the constant improvement of the integrated circuit industry requirements for integration,it ＇s also deeply researched to photoresist. This article reviews various kinds of photoresists,and the characteristics and application scope of simple are also introduced.

关 键 词：光致抗蚀剂 紫外光 电子束 X射线 离子束 纳米压印 

分 类 号：TN304[电子电信—物理电子学]