我国直流电弧等离子体喷射金刚石膜制备技术历史、现状与趋势  

The history,Current Status and Trend of the DC Arc Plasma Jet Diamond Film Preparation Technique in China

作　　者：吕反修[1] 

机构地区：[1]北京科技大学材料学院,北京100083

出　　处：《超硬材料工程》2014年第2期18-25,共8页Superhard Material Engineering

摘　　要：在热丝CVD(HFCVD),微波等离子体CVD(MWCVD),直流电弧等离子体喷射(DC Arc Plasma Jet)和燃烧火焰沉积(Flame Deposition)四种应用最广泛的金刚石膜制备方法中,DC Arc Plasma Jet被认为是最有工业化应用前景的技术。在我国863计划的大力支持下,北京科技大学和河北省科学院紧密合作,采用具有我国独立知识产权和特色的磁控长通道旋转电弧等离子体炬和半封闭式气体循环技术,于1995年底研制成功了100千瓦级高功率DC Arc Plasma Jet金刚石膜沉积系统。目前的技术水平已可制备和工业化生产包括工具级,热沉级和光学级大面积高质量金刚石自支撑膜,并已在国内外市场销售。文章对我国DC Arc Plasma Jet技术的历史、现状和发展趋势进行了综述。Among the four most wildly used diamond film preparation techniques,namely Hot Filament CVD （HFCVD）,Microwave Plasma CVD （MWCVD）,DC Arc Plasma Jet and Flame Deposition,the DC Arc Plasma Jet is considered as the most promising tech-nique for industrial application.With the support of the “863”program of Chinese gov-ernment,a 100kW high power DC Arc Plasma Jet diamond film deposition system has been successfully developed in 1995 by joint effort of University of Science and Technolo-gy Beijing and Hebei Academy of Sciences.The techniques adopted by them are Magnetic Controlled Long Channel Rotating Arc Plasma Flame and Semi-enclosed Gas Cycle Tech-nology,both of which have an independent intellectual property right in China.The cur-rent technique is adequate to support product preparation and industrial production of large size high quality free-standing diamond film including tool quality,heat sink quality and optical quality.The product has been traded both in the domestic and oversea mar-ket.This article summarizes the history,current status and trend of the DC Arc Plasma Jet technique in China.

关 键 词：高功率直流电弧等离子体喷射 金刚石膜 产业化 综述 

分 类 号：TQ163[化学工程—高温制品工业]