MPCVD金刚石膜沉积技术及金刚石膜材料在微波电真空器件中的应用  

High Quality Diamond Films Material and its Application in Microwave Vacuum Electronic Devices

作　　者：唐伟忠[1] 丁明清[2] 李莉[2] 冯进军[2] 

机构地区：[1]北京科技大学新材料技术研究院,北京100083 [2]北京真空电子技术研究所微波电真空器件国家实验室,100015

出　　处：《真空电子技术》2014年第5期12-16,共5页Vacuum Electronics

摘　　要：金刚石膜是一种集众多优异性能于一身的新材料,尤其是其热导率高、绝缘性能好以及微波介电损耗低等特点,使金刚石膜在微波电真空器件领域有着重要的应用前景。目前,以微波等离子体化学气相沉积(MPCVD)方法制备高品质金刚石膜的技术已趋向成熟。本文将针对微波电真空器件这一应用背景,简要介绍国内外高品质金刚石膜MPCVD沉积技术的发展现状,进而对金刚石膜材料应用于微波电真空器件领域的一些典型实例进行简单的介绍。Diamond films as a new material possess a broad range of novel properties. In particular, ultrahigh thermal conductivity, high breakdown voltage as well as low dielectric loss make the material have good application potentials in the field of microwave vacuum electronic devices. In recent years, microwave plasma chemical vapor deposition （MPCVD） technique to produce diamond films have developed rapidly. The MPCVD technique used to produce high quality diamond films is introduced, and application fields of diamond films as a practical material is reviewed, with a special attention paid to the field of microwave vacuum electronic devices.

关 键 词：微波等离子体法 金刚石膜 微波电真空器件 

分 类 号：O484[理学—固体物理]