热处理对离子束溅射Ta_2O_5薄膜特性的影响  

Effects of annealing on properties of Ta_2O_5 thin films deposited by ion beam sputtering

作　　者：刘华松[1,2,3] 姜承慧[1,2] 王利栓 刘丹丹[1,2] 季一勤[1,2,3] 陈德应[3] 

机构地区：[1]中国航天科工飞航技术研究院 [2]天津津航技术物理研究所,天津300192 [3]哈尔滨工业大学 光电子技术研究所 可调谐激光技术国家级重点实验室,黑龙江哈尔滨150080

出　　处：《光学精密工程》2014年第10期2645-2651,共7页Optics and Precision Engineering

基　　金：国家自然科学基金重点项目(No.61405145;No.61235011);中国博士后科学基金资助项目(No.2014M560104);天津市自然科学基金资助项目(No.13JCYBJC17300)

摘　　要：利用离子束溅射沉积技术制备了Ta2O5薄膜,在100～600℃的大气氛围中对其进行热处理（步进温度为100℃）,并对热处理后样品的光学常数（折射率、折射率非均匀性、消光系数和物理厚度）、应力、晶向和表面形貌进行了研究.研究显示,随着热处理温度增加,薄膜折射率整体呈下降趋势,折射率非均匀性和物理厚度呈增加趋势,结果有效地改善了薄膜的消光系数和应力,但薄膜的晶向和表面形貌均未出现明显的变化.结果表明：热处理可以有效改变薄膜特性,但需要根据Ta2O5薄膜具体应用综合选择最优的热处理温度.本文对离子束溅射Ta2O5薄膜的热处理参数选择具有指导意义.Ta2O5 films were deposited by Ion Beam Sputtering （IBS） technique and they were annealed in air at the temperatures from 100 ℃ to 600℃ with a step of 100℃. Then the optical constants after annealing （refractive index, the inhomogeneity of refractive index, extinction coefficient and physical thickness）, stress, crystalline and surface morphology were systematically studied. The experimental results indicate that with the annealing temperature increasing, the refractive indexes of the films de- crease in the mass and the inhomogeneity of refractive index and the film thickness increase, by which the extinction coefficient and stress are improved. However, the crystal orientation and surface mor- phology of the films are no significant change. These results demonstrate that the thermal processing changes the characteristics of films but the thermal processing temperature for Ta2O5 films should beselected based on the application demands. These results will be a reference for parameter selection in Ta2O5 film deposition by the IBS.

关 键 词：离子束溅射 Ta2O5薄膜 退火温度 光学常数 薄膜折射率 

分 类 号：O484.1[理学—固体物理]