基于同步辐射光刻工艺和电铸工艺的金属纳米光栅模具制备  

Fabrication of Metal Nano Grating Mold Based on Synchrotron Radiation Lithography and Nano Electroforming Process

作　　者：李以贵[1] 杉山进[2] 

机构地区：[1]上海应用技术学院理学院,上海201418 [2]日本立命馆大学微系统系

出　　处：《中国激光》2014年第11期178-182,共5页Chinese Journal of Lasers

基　　金：国家自然科学基金(51035005);上海应用技术学院光电精密检测平台建设项目(10210Q140005);上海应用技术学院引进人才启动基金(10120K146003-YJ2014-03)

摘　　要：随着微电子技术的发展,有必要研究在基板上制备高深宽比并拥有垂直侧壁的微纳结构。基于X射线可以制备高质量的纳米母光栅,利用精密纳米电铸技术从母光栅中复制出高质量的微纳金属光栅模具。研究了一种高深宽比的金属镍光栅模具的制备技术。基于同步辐射光刻技术,在硅基板上制备线宽分别为0.25,0.5,1μm,高2.0μm的聚甲基丙烯酸甲酯(PMMA)光栅。利用精密电铸技术,得到线宽分别为0.25,0.5,1μm的金属镍纳米光栅模具,1μm的金属光栅深宽比达1.5。为了获得高质量的PMMA纳米光栅母模,使用了粘接剂,克服了光栅倒伏的缺陷,优化曝光参数,消除了结构底部出现的多余的小三角形结构。With the development of microelectronics technology,it is necessary to study the fabrication process for high aspect ratio and a vertical sidewalls micro-nanostructures on the substrate.High quality nano master grating can be fabricated by X-rays lithography.By using sophisticated nano electroforming technology,high-quality nano metal grating can be replicated from the mother mold grating.A technique for preparing high aspect ratio diffraction grating metal molds is introduced.Based on synchrotron radiation lithography technique,polymethyl methacrylate（PMMA）nano gratings with line width of 0.25,0.5,1μm,and the height of 2.0μm are prepared on a silicon substrate.Using precision electroforming technique,nickel nano-grating mold with the line width of 0.25,0.5,1μm,and the1μm gratings aspect ratio of 1.5 is fabricated from the PMMA grating master mold.In order to obtain high-quality PMMA nano-grating,the adhesive is used to overcome the deficiencies of structures collapsed,by optimizing exposure parameters,small triangular structures at the bottom of the gratings are eliminated.

关 键 词：光学制造 同步辐射光刻 金属光栅模具 纳米电铸 聚甲基丙烯酸甲酯 母模 粘接剂 

分 类 号：TN305.7[电子电信—物理电子学]