Fabrication of low threshold current monolithic DFB laser with an MMI combiner  

作　　者：赵建宜 陈鑫 周宁 黄晓东 刘文 

机构地区：[1]Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information,Huazhong University of Science and Technology [2]Accelink Technologies Company, Ltd [3]Institute of Advanced Technology, University of Science and Technology of China

出　　处：《Chinese Optics Letters》2014年第11期99-102,共4页中国光学快报（英文版）

基　　金：supported by the National 863 Program of China(Nos.2011AA010304 and 2011AA010306);the National 973 Program of China(No.2010CB327603)

摘　　要：We fabricate low threshold current monolithic distributed feedback（DFB） laser with a multi-mode interface（MMI） combiner using butt-joint metal-organic chemical vapor deposition technology with different waveguide structures. Multi-layer mask self-aligned photolithography technology is used to form different waveguides in active and passive regions, respectively. The result shows that the laser threshold current is lower than 10 m A, with 50 d B side-mode suppression ratio.We fabricate low threshold current monolithic distributed feedback（DFB） laser with a multi-mode interface（MMI） combiner using butt-joint metal-organic chemical vapor deposition technology with different waveguide structures. Multi-layer mask self-aligned photolithography technology is used to form different waveguides in active and passive regions, respectively. The result shows that the laser threshold current is lower than 10 m A, with 50 d B side-mode suppression ratio.

关 键 词：Distributed feedback lasers Metallorganic chemical vapor deposition Organic chemicals ORGANOMETALLICS PHOTOLITHOGRAPHY Waveguides 

分 类 号：TN248[电子电信—物理电子学] TN248.4