检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
出 处:《电子工业专用设备》2014年第2期11-17,60,共8页Equipment for Electronic Products Manufacturing
摘 要:图形化蓝宝石衬底(PSS)工艺在改善GaN晶体外延生长质量以及提升LED器件发光提取效率方面作用显著,并被LED行业大量采用。针对高亮度LED量产线大量采用二手投影光刻机制备PSS衬底所面临的焦深不足、垂向控制容易离焦,以及运动台拼接精度不足等问题导致的PSS良率仅有70%-80%的现象,有针对性地在新研制的高亮度LED光刻机中采用最佳线宽/焦深选择技术、无缝拼接技术、Mapping垂向控制技术,使PSS的制造良率达到95%以上,极大地降低了PSS制造返工成本。同时,针对芯片细电极曝光需求,采用精密机器视觉对准技术,实现了芯片电极层1μm线宽下200 nm套刻精度。Patterned substrate sapphire(PSS) has attracted much interest in recent years due to its outstanding properties in improving GaN epitaxial crystal quality and light output powers of the LEDs. The used stepper is poor in DOF(Depth of Focus), and vertical-controlling, and field-to-field stitching precision, therefore, the PSS yield is only about 70%-80% in mass production. The SSB300 HB-LED stepper makes PSS yield reached 95% above, great to reduce PSS manufacturing rework cost, by using the best CD/DOF strategy, and seamless stitching technology, and mapping vertical controlling technology, etc. Meanwhile, in term of the demand of PAD finger technology, the SSB300 stepper can reach 1μm resolution CD and 200nm overlay PAD process by using precise MVS alignment technology.
分 类 号:TN304[电子电信—物理电子学] TN305
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:18.191.251.36