模拟软件在基区方阻实验中的应用  

Application of Simulation Software in Square Resistance Experiment of the Base Regain

作　　者：宋玲玲[1] 刘剑[1] 李浩 

机构地区：[1]中国电子科技集团公司第四十七研究所 [2]93271部队

出　　处：《微处理机》2014年第6期14-16,共3页Microprocessors

摘　　要：随着IC工艺和器件物理研究的进展以及计算机技术的发展成熟,集成电路模拟软件的功能和应用也同步扩展。目前国内大型生产线上几乎均采用了同类软件,主要用于工艺建模、优化工艺流程,一旦模拟与实验拟合较好,建立模型库,将极大的节省实验所需时间、人力和物料。主要采用的是Sentaurus TCAD软件模拟了TTL工艺的基区注入后扩散情况,模拟结果与实验结果非常接近,该结果已经多次应用在产品的研制生产中。With the progress of the IC technology and device physics research and the development of computer technology, function and application of the integrated circuit simulation software is also synchronized expansion. For process modeling and optimization of process procedure, the same software is almost used in the domestic large production line. As the simulation and experiment fitting are better, the establishment of model base will greatly save the time for the experiment, the manpower and materials. The Sentaurus TCAD software is used to simulate the situation of the base region spread after injection of TFL process. The simulation results are close to the experimental ones, which are used in the development and production of the product for many times.

关 键 词：模拟 工艺 结深 方阻 

分 类 号：TN402[电子电信—微电子学与固体电子学]