线形同轴耦合微波等离子体诊断及硅薄膜制备  

Diagnosis of linearly coaxially coupled microwave plasma and preparation of silicon thin films

作　　者：李慧[1] 吴爱民[1,2,3] 张文兰[4] 陆文琪[2,4] 秦福文[2,4] 董闯[1,2] 

机构地区：[1]大连理工大学材料科学与工程学院,辽宁大连116024 [2]大连理工大学三束材料改性教育部重点实验室,辽宁大连116024 [3]大连理工大学常州研究院,江苏常州213164 [4]大连理工大学物理与光电工程学院,辽宁大连116024

出　　处：《哈尔滨工程大学学报》2015年第3期423-426,共4页Journal of Harbin Engineering University

基　　金：江苏省自然科学基金资助项目(BK2011252);常州市工业支撑计划资助项目(CE20110012);中央高校基本科研业务费专项资金资助项目(DUT13JN08;DUT12JN02)

摘　　要：开发了一种新型线形同轴耦合大面积微波等离子体源,针对该新型等离子体源放电空间等离子密度及分布的不明确性,利用朗缪尔单探针法研究了不同放电参数下该等离子体源等离子体密度及空间分布情况。以微波功率,氢氩总流量(氢氩流量比为3∶1)和距石英管的距离Z为3个因素设计正交实验探究了宏观放电参量对等离子体参数的影响。测试结果表明该型等离子体源的电子密度均在1010cm-3以上。其次,诊断了在距石英管Z为14 cm处,等离子体参数沿空间水平的分布情况,探究薄膜的最佳沉积区域。最后,根据等离子诊断情况进行硅薄膜的沉积,由XRD结果表明薄膜为多晶结构,拉曼光谱显示沉积硅薄膜晶化率均在92%以上,沉积速率在8 nm/min。A new type of large area linearly coaxially coupled microwave plasma source has been developed. In order to obtain the plasma density and its special distribution of this new type of plasma source,Langmuir probe method is used to diagnose the discharge characteristics of the source under different discharge parameters. Three elements,including influence of microwave power,total gas flow（ the discharge gas is the mixture of hydrogen and argon gases,while the flow ratio of hydrogen and argon gases is 3 ∶ 1） and the distance Z from the quartz tube were used to design orthogonal experiment. Therefore,the influence of macroscopic discharge parameters on plasma parameters is studied.The test result showed that the electron density of the plasma is above 10^10cm^-3. The horizontal distributions of plasma parameters at the position 14 cm away from the quartz tube were diagnosed to get the best region of films deposition.At last the silicon thin films were deposited according to the plasma diagnosis. An X-ray diffraction（ XRD） spectrum shows silicon films of deposition are polycrystalline silicon thin films and the Raman spectra results revealed that the crystalline ratio of the films is above 92% and the deposition rate of the films is about 8 nm / min.

关 键 词：线形同轴耦合微波等离子体 等离子体诊断 电子密度 多晶硅薄膜 拉曼 XRD 

分 类 号：TN304.055[电子电信—物理电子学]