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作 者:尚鹏[1,2] 李定[1,2] 艾万君[1] 熊胜明[1]
机构地区:[1]中国科学院光电技术研究所,成都610209 [2]中国科学院研究生院,北京100049
出 处:《光电工程》2015年第5期45-51,共7页Opto-Electronic Engineering
摘 要:在高温环境下,由于不匹配性而产生的热应力是影响薄膜结构及性能稳定性的重要因素。本文使用有限元的方法,从热应力的角度研究分析了高温环境下导致薄膜损伤的内在机理及相关可能的改善方法。仿真结果表明,在高温环境下,基板与薄膜匹配性对系统热应力的大小及结构的稳定性有非常大的影响;相比白宝石//Ti O2系统,Si//Ti O2薄膜存在较高的应力水平及边缘应力集中与突变现象;采用Ti O2+Si O2复合过渡层的方法对于降低和调控薄膜-基底应力梯度的变化有很好的作用。Thermal stress due to the mismatch between the coating and substrate is an important factor to ensure the reliability of the coating for its various structural and function applications at high temperature. In the present work, the thermal stress distributions through the thickness of TiO2 coating-substrate systems, as well as the effect of the mismatch between the coating and substrate, and the intermediate composite layer (which is a graded composite made of the SiO2 and TiO2 materials) on the thermal stress are evaluated by Finite Element Method (FEM). The results show that TiO2 coating on Si substrate exhibits high thermal stress at high temperature compared to the sapphire//Ti02 system and TiO2-SiO2 material as the intermediate composite layer is effective for decreasing and controlling the stress distribution.
关 键 词:热应力 有限元方法 TiO2/SiO2薄膜 复合过渡层
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