聚乙烯薄膜表面沉积纳米SiO_x涂层的阻隔性能  

Barrier Properties of SiO_x Coatings Deposited on Polyethylene Films

作　　者：桑利军[1] 王敏[1] 陈强[1] 刘忠伟[1] 王正铎[1] 

机构地区：[1]北京印刷学院等离子体物理及材料研究室,北京102600

出　　处：《中国表面工程》2015年第3期36-41,共6页China Surface Engineering

基　　金：北京市教育委员会科研计划面上项目(KM201310015006);国家自然科学基金(11175024);2014年北京市本科生科学研究计划项目(08150114/040);北京印刷学院校级资助项目(Eb201502)

摘　　要：为了提高药品包装用聚乙烯(PE)薄膜的阻隔性能,利用射频等离子体增强化学气相沉积技术,以氧气(O2)和六甲基二硅氧烷(HMDSO)作为氧化性气体和硅源单体,在PE薄膜表面沉积一层纳米厚度的柔性SiOx涂层。采用傅里叶变换红外吸收光谱、原子力显微镜和气体透过率测试仪对SiOx涂层的化学结构成分、表面微观形貌和气体阻隔性能进行表征。结果表明:SiOx涂层的化学结构和表面形貌对其阻隔性能有显著的影响。沉积工艺参数对SiOx涂层的阻隔性能起到了至关重要的作用。经过参数优化后制备的SiOx涂层可以有效地提高PE薄膜对氧气的阻隔性能,当射频功率为50 W,氧气和六甲基二硅氧烷的比例为2∶1,沉积气压为20Pa时制备的SiOx涂层的透氧值可从原膜的3 000mL/(m2·d)降低到30mL/(m2·d),对氧气的阻隔率可以提高100倍。To improve the barrier properties of the pharmaceutical packaging polyethylene（PE） film, a nanoscale flexible SiOx coating was deposited on polyethylene （PE） webs by radio frequency （RF） plasma enhanced chemical vapor deposition, in which oxygen （O2） and hexamethyldisiloxane （HMDSO） being employed as oxidizing gas and Si monomer, respectively. The chemical structure, surface morphologies and gas barrier properties of the coating were studied through Fourier transform infrared spectroscope （FTIR）, atomic force microscope （AFM） and gas permeability tester. The results show that both chemical structures and surface features of the coatings have a remarkable influence on the barrier properties. The deposition parameters play a crucial role in the barrier properties of the SiOx coatings. The SiOx coatings prepared after parameter optimization can effectively increase the oxygen barrier properties of PE films. With the RF power being 50 W, the ratio of O2∶HMDSO being 2∶1 and the working pressure being 20 Pa, the oxygen permeability of the SiOx coating drops from 3 000 mL/（m^2·d） to 30 mL/（m^2·d）, and the oxygen barrier rate of the coating can increase by 100 times.

关 键 词：射频等离子体 SiOx涂层 PE薄膜 气体透过率 

分 类 号：TG174.444[金属学及工艺—金属表面处理] TB484[金属学及工艺—金属学]