大学研究型物理实验教学的实施与探讨——以PECVD技术制备硅基薄膜为例  

Implementation and Discussion on University Research-type Physics Experiment Teaching—— As An Example of Preparation Silicon Thin Film by PECVD Technology

作　　者：高惠平[1] 田建军[1] 蒋俊华[1] 毛艳丽[1] 

机构地区：[1]河南大学物理与电子学院

出　　处：《物理通报》2015年第7期79-82,共4页Physics Bulletin

摘　　要：研究型实验是培养大学生创新意识、创新能力和科学研究素养的重要教学内容.以等离子体增强化学气相沉积（PECVD）技术制备硅基薄膜为例,详细介绍了开展研究型实验教学的实施方法,分析和讨论了此研究型实验对培养学生理论联系实践能力、创新能力和科学研究能力的作用.Research- type experiment teaching is an important way to cultivate students innovation consciousness,innovation ability and scientific research quality. Taking the experiment of ＂prepare silicon thin film by plasma enhanced chemical vapor deposition （PECVD） technique＂ for example, this paper discussed how to carry out a research-oriented experiment. The effect on training students＂ theory with practical ability, innovation ability and scientific research ability was analyzed and discussed.

关 键 词：研究型实验 等离子体化学气相沉积 硅薄膜 

分 类 号：O484.1-4[理学—固体物理] G642[理学—物理]