PPC表面沉积SiO_x工艺与其包装性能研究  

Deposition Technique of SiO_x Layer on Poly(Propylene Carbonate) Surface and Its Packaging Characteristics

作　　者：宋树鑫[1] 刘林林[1] 张晓燕[1] 云雪艳 梁晓红[1] 王羽[1] 呼和[1] 董同力嘎 

机构地区：[1]内蒙古农业大学,呼和浩特010018

出　　处：《包装工程》2015年第13期8-14,共7页Packaging Engineering

基　　金：国家自然科学基金(51163010)

摘　　要：目的提高聚碳酸亚丙酯(PPC)薄膜的阻隔性。方法采用等离子体增强化学气相沉积法在PPC薄膜表面上沉积SiOx层,并以阻氧性能为工艺评估指标。结果采用等离子体增强化学气相沉积法可以在PPC薄膜表面沉积SiOx层,最佳工艺条件为沉积功率150 W、六甲基硅氧烷流量为6 m L/min,氧化流量为12 m L/min、沉积时间60 min,通过沉积SiOx层,PPC薄膜的阻氧性能得到了有效的提高。结论采用等离子化学气相沉积法在PPC薄膜上沉积SiOx层可明显提高对氧气、水蒸气和紫外线的阻隔性能,并保持原有韧性。This study aimed to improve the barrier property of poly（propylene carbonate）（PPC）. In this study, the SiOx layer was deposited on the PPC film surface by plasma enhanced chemical vapor deposition（PECVD） technique, and the evaluation on oxygen barrier property was used as the research target. The SiOxlayer was successfully deposited on PPC film surface by PECVD technique, and the optimum process was 150 watts of power, 6 m L/min∶12 m L/min of HMDSO/O2,and 60 min of deposition time, and the oxygen barrier of PPC was enhanced observably by deposition of SiOxlayer. The barrier property of PPC against oxygen, vapor and UV was improved by deposition of SiOxlayer on its surface by PECVD technique and its toughness was retained.

关 键 词：聚碳酸亚丙酯 SiOx层 等离子化学气相沉积法 阻隔性能 

分 类 号：TB484.6[一般工业技术—包装工程]