Ti-Ni形状记忆合金薄膜的研究进展  

Research Progress of Ti-Ni Shape Memory Alloy Films

作　　者：刘琳[1] 贺志荣[1] 周超[1] 李旭东[1] 

机构地区：[1]陕西理工学院材料科学与工程学院,陕西汉中723003

出　　处：《铸造技术》2015年第6期1346-1349,共4页Foundry Technology

基　　金：陕西省大学生创新创业训练计划资助项目(1628);陕西省教育厅科研计划资助项目(12JK0436)

摘　　要：综述了Ti-Ni形状记忆合金(SMA)薄膜的制备、特性及应用的研究现状。介绍了影响Ti-Ni SMA薄膜性能的相关因素及磁控溅射和熔体快淬两种Ti-Ni基SMA薄膜的制备方法,论述了Ti-Ni基SMA薄膜在微机电系统中的应用。最后,指出了Ti-Ni SMA薄膜存在的问题及今后的研究方向。The research status of the fabrication, properties and applications of Ti-Ni shape memory alloy（SMA） thin films were reviewed. The influencing factors of the properties of Ti-Ni SMA thin films and the two preparation methods of the magnetron sputtering deposition and the fast melt quenching for the thin films were mainly introduced. The applications of Ti-Ni SMA thin films in micro-electro-mechanical system were discussed and lastly the problems and future researching direction of Ti-Ni SMA thin films were presented.

关 键 词：Ti-Ni形状记忆合金薄膜 磁控溅射 熔体快淬 微机电系统 

分 类 号：TG139.6[一般工业技术—材料科学与工程]