一种激光直写式光刻光路系统  

A Laser Direct Writing Lithography Optical System

作　　者：孙明睿[1] 甄万财[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176

出　　处：《电子工业专用设备》2015年第5期18-20,49,共4页Equipment for Electronic Products Manufacturing

摘　　要：针对曲面栅网器件的光刻工艺,提出了一种可动态调焦的激光直写式光刻系统,该系统将紫外激光器的光束经过整形扩束、动态z向调焦、x/y振镜、聚焦等单元使器件上相应位置涂覆的光刻胶直接感光,再经过显影、刻蚀等工艺直接制作出相应器件。它可以应用到一些精度要求不太高的平面或非平面器件的光刻加工工艺,取代传统的使用掩模版的光刻工艺或其它的加工工艺。According to the lithography process of curved surface grid device,a laser direct writing lithography optical system is brought forward. The laser beam passes through expander,dynamic focusing,x/y galvanometer scanner system and focusing part of the system in turn,and let photoresist on the device be exposed directly,then by develop It could be used on the lithography process of planar or spherical devices with low or middling precision,and substitutes the traditional lithography process or other processes using mask.

关 键 词：动态调焦 直写式 光刻 

分 类 号：TN305.7[电子电信—物理电子学]