提高MPCVD金刚石薄膜均匀性的研究  

Study on Improving the Uniformity of MPCVD Diamond Films

作　　者：赵彦君[1] 何莲[1] 阳硕 张文豪[1] 满卫东[1] 

机构地区：[1]武汉工程大学湖北省等离子体化学与新材料重点实验室,湖北武汉430073

出　　处：《硬质合金》2015年第3期213-220,共8页Cemented Carbides

基　　金：国家自然科学基金(NO.11175137);武汉工程大学第九期校长基金(NO.2014028)

摘　　要：金刚石具有诸多优异的物理和化学性质,使得它在许多高新技术领域如:热沉、光学窗口、光导探测器等方面拥有广阔的应用前景。MPCVD法制备金刚石薄膜具有无极放电、沉积温度低等独特优势,是最具潜力制备高质量均匀金刚石薄膜的方法。文章从CH4和H2的浓度和流量,CO2、O2、H2O气体掺杂,微波功率和气压,2.45 GHz和915 MHz两种微波频率、衬底偏压以及衬底位置等方面,综述了不同的沉积参数对金刚石薄膜均匀性的影响。在保证金刚石薄膜质量的前提下,对如何提高金刚石薄膜均匀性进行讨论。结合市场上已经产业化的产品,在适宜的沉积参数和设备条件下可以制备出高质量均匀的金刚石薄膜,并且展望了金刚石薄膜的发展趋势。Diamond has a series of excellent physical and chemical properties, which makes it possess a broad application prospect in many high technical fields, such as heat sink, optical window, photoconductive diamond detectors,etc. The method to grow diamond films by MPCVD has unique advantages like limitless discharge and low deposition temperature, which is the most promising way for the preparation of high quality diamond thin films. The effects of different deposition parameters, including the concentration and flows of methane and hydrogen, carbon dioxide and oxygen and water gas doping, microwave power and gas pressure, different microwave frequency on 2.45 GHz and 915 MHz, substrate bias and substrate position, on the diamond films uniformity were introduced. On the premise of ensuring the quality of diamond film,the way to improve the uniformity of diamond film was discussed. With the industrial production in the market, high quality and uniform diamond films could be produced at suitable deposition parameters and devices. And the development trend of diamond film was prospected.

关 键 词：微波等离子体化学气相沉积 均匀性 偏压 沉积参数 金刚石薄膜 

分 类 号：TB383.2[一般工业技术—材料科学与工程]