高数值孔径投影光刻物镜波像差的自动平衡优化  

Automatic balancing of wavefront aberrations in high-numerical aperture lithographic lenses

作　　者：徐明飞[1,2] 黄玮[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春130033 [2]中国科学院大学,北京100049

出　　处：《光学精密工程》2015年第8期2143-2148,共6页Optics and Precision Engineering

基　　金：国家科技重大专项资助项目(No.2012ZX02701001-007)

摘　　要：考虑高数值孔径(NA)投影光刻物镜视场较大、波像差分布不均匀,本文提出了一种自动优化设计方法来降低设计过程中出现的全视场最大波像差。该方法通过将一个自动调节采样视场权重的循环程序附加在光刻物镜的局部优化程序之外来自动平衡全视场的波像差,进而降低全视场的最大波像差。设计实例证明,运用该方法后光刻物镜全视场波像差的均匀性显著提高,最大波像差降低为原来的63%。该方法在光学设计软件Code V中有良好的应用效果,应用该方法不但能节省光刻物镜设计者的时间,而且会降低设计对设计者设计经验的依赖性。同时,该方法也可推广应用在其他对成像质量要求较高的光学系统设计中。As high-numerical aperture（NA）lithographic lenses have larger fields of view（FOVs）and nonuniform wavefront aberration distributions,this paper proposes an automatic optimized design method to reduce the the largest wavefront aberration of all FOVs in design processing.The method adds an external loop optimization procedure which can automatically adjust sampling weight into the local optimization procedure of a lithographic lens to balance wavefront aberrations and to reduce the largest wavefront aberration automatically.By using the proposed method,the uniformity of wavefront aberrations gets better and the largest wavefront aberration has been reduced to 63% of the primary value.It shows that the method has a better application in Code V.Meanwhile,it not only reduces the design time consumption but also the dependence on the design experiences of the designers.this method can also be applied in design of other optical systems with higher imaging quality.

关 键 词：投影物镜 光刻物镜 波像差 光学设计 自动优化 

分 类 号：TN305.7[电子电信—物理电子学]