采用一次曝光制备连续面形螺旋相位板的方法  

Method to Fabricate Spiral Phase Plate with Continous Surface by One Exposure Processing

作　　者：史立芳[1] 曹阿秀[1] 郭书基 罗雪[1] 秦燕云 邓启凌[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《光学学报》2015年第A01期314-319,共6页Acta Optica Sinica

摘　　要：提供了一种制备连续面形螺旋位相板（SPP）的方法。通过将三维目标面形在一维方向上按照一定的间隔进行抽样处理，进而将获得的样条按照比例平铺在抽样空间内，获得与目标面形对应的二维掩模结构图形；利用该掩模结构在抽样方向上进行一次曝光即可获得目标面形。对该抽样方法、结构参数进行了分析，并且针对该方法开展了制备技术研究，制备出了4种电荷数分别为1，3，10和20的螺旋相位片，其适用波长为532nm，并对其光学效果进行了测试。A method for fabricating spiral phase plate （SPP） with continuous surface is proposed. An interval is used to quantize the three dimension surface of SPP into two dimension bars to form a binary mask. The exposure dose can be precisely modulated through this mask in the exposure process. The select criterion of the quantization interval is discussed in detail. As the results, four kinds of high-quality SPPs with topological charges 1,3, 10 and 20 are fabricated which can be used under the wavelength of 532 nm. The corresponding optical effects are also measured.

关 键 词：光学制造 光学漩涡 光刻 微光学元件 

分 类 号：O439[机械工程—光学工程]